Plasma processing method

Details Plasma processing method Plasma processing method

1995-06-05

1997-05-06

Pianalto, Bernard

Coating processes

Direct application of electrical, magnetic, wave, or...

Pretreatment of substrate or post-treatment of coated substrate

427249, 427250, 4272552, 4272553, 427294, 427299, 427444, 427539, 427547, 427553, 427571, 427574, 427576, 427578, 427585, 427598, H05H 100

Patent

active

056269226

ABSTRACT:
A method for forming a film by a plasma CVD process in which a high density plasma is generated in the presence of a magnetic field is described, characterized by that the electric power for generating the plasma has a pulsed waveform. The electric power typically is supplied by microwave, and the pulsed wave may be a complex wave having a two-step peak, or may be a complex wave obtained by complexing a pulsed wave with a stationary continuous wave of an electromagnetic wave having the same or different wavelength as that of the pulsed wave. The process enables deposition of a uniform film having an excellent adhesion to the substrate, at a reduced power consumption.

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