Photoresist composition

Details Photoresist composition Photoresist composition

1997-07-14

1999-03-23

Chu, John S.

Radiation imagery chemistry: process, composition, or product th

Diazo reproduction, process, composition, or product

Composition or product which contains radiation sensitive...

430 28, 430167, 430197, G03F 7012, G03C 500

Patent

active

058857443

ABSTRACT:
A photoresist composition containing a photo-curing polymer and a photosensitive agent, wherein the photosensitive agent comprises at least two compounds selected from the group consisting of 4,4'-diazido-2,2'-stilbenedisulfonate sodium salt, 4,4'-diazo-2,2'-dibenzalacetone disulfonate disodium salt, 2,5-bis(4-azido-2-sulfobenzylidene) cyclopentanone disodium salt and 4,4'-diazido-2,2'-dicinnamylideneacetone sulfonate salt. By performing a lithography process using the photoresist composition, the exposure time can be shortened, thereby improving the yield of products.

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patent: 4332874 (1982-06-01), Hayashi et al.
Patent Abstracts of Japan, Publn. No. 01173028, Jul. 1989.
Patent Abstracts of Japan, Publn. No. 07120920, May 1995.
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Patent Abstracts of Japan, Publn. No. 57146247, Sep. 1982.
Database WPI, No. XP002045823, Oct. 1976.
Database WPI, No. X002045824, Jul. 1974.

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