Treatment process for depositing a layer of carbon in vapour pha

Stock material or miscellaneous articles – All metal or with adjacent metals – Having composition – density – or hardness gradient

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427249, 427577, 427590, 148206, B32B 1504, C23C 824, C23C 1602, C23C 1626

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active

053087070

ABSTRACT:
The process with a view to imparting to the treated article a resistance to frictional wear, a corrosion resistance, and a color, is characterized according to the invention in that the surface of the article is subjected to a thermochemical pretreatment under electric plasma in a vessel under an atmosphere containing reactive species such as N.sub.2 and hydrogen, the reactive species diffusing into and precipitating in the metal matrix of the article to form a diffusion sublayer and in that a layer of carbon in vapor phase is deposited under electric plasma on the surface thus treated, in the same vessel, the composition of the atmosphere for the pretreatment being gradually modified, on the one hand, by the introduction of a hydrocarbon and/or of a silane in the gaseous state and, on the other hand, by progressive reduction of the partial pressures of the reactive species employed during the pretreatment, and the maintenance of the hydrocarbon atmosphere for the carbon deposition.

REFERENCES:
patent: 3230110 (1966-01-01), Smith
patent: 3368914 (1968-02-01), Darnell et al.
patent: 3656995 (1872-04-01), Reedy
patent: 3684585 (1972-08-01), Stroup et al.
patent: 3900592 (1975-08-01), Kennedy et al.
patent: 4414085 (1983-11-01), Wickersham et al.
patent: 4996079 (1991-02-01), Itoh
Patent Abstracts of Japan, vol. 14, No. 334 (C-742)(4277), Jul. 18, 1990, & JP-A-2-122-075, May 9, 1990, Morihiro Okada, et al., "Coating Method With Hard Carbon Film".
Journal of Vacuum Science & Technology A, vol. 5, No. 6, pp. 3287-3312, Nov., 1987, Hsiao-chu Tsai, et al., "Characterization of Diamondlike Carbon Films and Their Application as Overcoats on Thin-Film Media for Magnetic Recording".

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