Method of aligning two members utilizing marks provided thereon

Details Method of aligning two members utilizing marks provided thereon Method of aligning two members utilizing marks provided thereon

1984-05-24

1986-05-20

Anderson, Bruce C.

Radiant energy

Means to align or position an object relative to a source or...

G01N 2100, G01N 2300

Patent

active

045903824

ABSTRACT:
Alignment marks are formed on the opposite surfaces of a photoelectric mask and a wafer. Each mark has a plurality of lines provided at a predetermined pitch. Widths of the lines of the photoelectric mask are progressively increased. On the while, widths of the lines of the wafer are progressively decreased. The marks of the wafer and the mask are opposite to each other such that lines of the maximum and minimum widths are opposite to each other. The overlapping area of the marks changes quadratically as a function of positional deviation between the mask and the wafer. When the mask is irradiated with ultraviolet light, X-rays are emitted from the mark on the wafer at an intensity corresponding to the overlapping area and are detected by an X-ray detector. The intensity of X-rays emitted changes quadratically as a function of deviation. The electron beam is scanned, and a detection signal is synchronously detected. The obtained PSD signal does not have a nonsensitive region and changes linearly as a function of deviation even if the beam scan width is narrow.

REFERENCES:
patent: 3832560 (1974-08-01), O'Keefe
patent: 3843916 (1974-10-01), Trotel
patent: 4327292 (1982-04-01), Wang et al.
patent: 4469949 (1984-09-01), Mori et al.
IEEE Transactions on Electron Devices, vol. ED-22, No. 7, Jul. 1975, pp. 409-413; J. P. Scott.

Affiliated with

Also associated with

Rating

Method of aligning two members utilizing marks provided thereon does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method of aligning two members utilizing marks provided thereon, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method of aligning two members utilizing marks provided thereon will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-2110400