Method of forming aluminum interconnection layer

Coating processes – Coating by vapor – gas – or smoke – Metal coating

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4272557, 4273833, 20419217, 438632, 438637, 438681, 438688, C23C 1620, H01L 214763

Patent

active

061239925

ABSTRACT:
A method of forming an aluminum-based layer mainly including aluminum on a surface of an insulating layer and within a hole formed in the insulating layer. The method includes the steps of: carrying out a chemical vapor deposition to deposit the aluminum-based layer on the surface of the insulating layer and also to incompletely fill the hole to not less than 75% by volume of the hole by use of a source including at least one of alkyl groups and hydrogen so that a surface of the aluminum-based layer is terminated by the at least one of alkyl groups and hydrogen included in the source, and so that the surface of the aluminum-based layer is free of any natural oxide film; and carrying out a heat treatment, without formation of any natural oxide film on the surface of the aluminum-based layer, for causing a re-flow of the aluminum-based layer, whereby the at least one of alkyl groups and hydrogen promotes a migration of aluminum atoms on the surface of the aluminum-based layer.

REFERENCES:
patent: 5877087 (1999-03-01), Mosely et al.
patent: 5963835 (1999-10-01), Sandhu et al.
patent: 5970377 (1999-10-01), Park
patent: 5981382 (1999-11-01), Konecni et al.
patent: 5985751 (1999-11-01), Koyama

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