Deposition process of a ceramic coating on a metallic substrate

Details Deposition process of a ceramic coating on a metallic substrate Deposition process of a ceramic coating on a metallic substrate

1992-11-13

1994-04-12

King, Roy V.

Coating processes

Direct application of electrical, magnetic, wave, or...

Pretreatment of substrate or post-treatment of coated substrate

427532, 427528, 4272481, 427314, 427327, B05D 306, C23C 1600

Patent

active

053024222

ABSTRACT:
The object of the present invention is a deposition process of a coating of the ceramic type based on carbides, nitrides, or carbonitrides of metallic elements such as Cr, V, Zr, W, Mo, Co, Mn, Ni, Hf, Ta, Ti, Nb and Fe in which the coating of the ceramic type is deposited at low temperature in the vapour phase on a metallic substrate from organo-metallic precursors wherein, prior to this deposition in the vapour phase and without subsequent placing in contact with an oxidizing and/or polluting atmosphere, a reactive ionic pickling is carried out in a reducing atmosphere.

REFERENCES:
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patent: 4873117 (1989-10-01), Hertz et al.
patent: 4959242 (1990-09-01), Itoh
Ryabova, "Thin films from organometallic compounds" Chapt. 5 North-Holland Publishing Co. 1981 (pp. 618-621 and 636).
STREM Chemicals, Inc. Catalog No. 13, 1989 p. 22.
Chemical Abstracts, vol. 89, Nov. 22, 1978, p. 252.
Plating vol. 53, No. 6, Jun. 1966, pp. 772-782.
J. E. Knap et al "Vapor Plating with Dicumenechromium Preparation and Properties of the Chromium Plate".

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