Silver halide photographic material containing polymeric spacing

Radiation imagery chemistry: process – composition – or product th – Radiation sensitive product – Identified backing or protective layer containing

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

430523, 430950, 430961, G03C 132

Patent

active

057167710

ABSTRACT:
Silver halide photographic material comprising finely divided solid spherical polymer beads having an average particle size between about 0.1 and about 10 .mu.m and having a glass transition temperature of at least 40.degree. C. The polymer beads are prepared by a one step reaction in an aqueous reaction medium whereby the polymer beads are formed by the simultaneous reaction of
1) a silane monomer comprising an .alpha.,.beta.-ethylenically unsaturated group,
2) at least one .alpha.,.beta.-ethylenically unsaturated monomer, different from the silane monomer, capable of forming a polymer that is soluble in the monomer(s) present in the aqueous solvent mixture but which is insoluble in water
3) a free radical-forming polymerization initiator that is soluble in the aqueous solvent mixture, and
4) a graft-polymerizable polymer containing hydrophilic groups, and capable of forming a graft polymer that remains soluble in the aqueous reaction mixture.

REFERENCES:
patent: 4614708 (1986-09-01), Timmerman et al.
patent: 5252660 (1993-10-01), Hazan et al.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Silver halide photographic material containing polymeric spacing does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Silver halide photographic material containing polymeric spacing, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Silver halide photographic material containing polymeric spacing will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-2076227

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.