Heat treatment machine for semiconductors

Details Heat treatment machine for semiconductors Heat treatment machine for semiconductors

1983-09-02

1986-04-08

Albritton, C. L.

Electric heating

Heating devices

Combined with container, enclosure, or support for material...

219354, 219405, 219411, H05B 100

Patent

active

045815208

ABSTRACT:
A heat treatment machine for heat-treating semiconductor wafers, each wafer having two faces. A first lamp is arranged to heat a first spot of first diameter on one face of the wafer and a second lamp is arranged to heat a second spot of second diameter on the other face of the wafer, both by reflection of emitted light off a focusing reflector. The lamps are moved in tandem such that the first spot travels along an Archimedes spiral relative to the center of the stationary wafer. The centers of the spots coincide, and the second diameter is greater than the first diameter.

REFERENCES:
patent: 3543717 (1970-12-01), Adachi
patent: 3648048 (1972-03-01), Cahan
patent: 3692572 (1972-09-01), Strehlow
patent: 3710069 (1973-01-01), Papadopoulos
patent: 3742181 (1973-06-01), Costello
patent: 3761677 (1973-09-01), Mizutani
patent: 3790054 (1974-02-01), Dahlberg
patent: 3956635 (1976-05-01), Chang
patent: 4338508 (1982-07-01), Jones
Von Gutfeld, R. J., "Crystallization of Silicon . . . ", IBM Tech. Disc. Bull., vol. 19, No. 10, Mar. 1977, pp. 3955-3956.

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