Thin film forming equipment

Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering

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Details

20429808, 20429823, C23C 1400

Patent

active

06074538&

ABSTRACT:
A gate valve for a thin film forming apparatus. The gate valve includes two adjoining low-pressure chambers and a wall separating the two chambers. The wall includes an aperture and a thin plate for covering the aperture. The thin plate is movable in a direction substantially parallel to the plate surface. The gate valve further includes a voltage supply for applying a direct current between the thin plate and the wall.

REFERENCES:
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patent: 4851101 (1989-07-01), Hutchinson
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patent: 4944860 (1990-07-01), Branhall
patent: 5082242 (1992-01-01), Bonne
patent: 5161774 (1992-11-01), Engelsdorf

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