Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
Patent
1997-06-10
2000-06-13
Nuzzolillo, Maria
Chemistry: electrical and wave energy
Apparatus
Coating, forming or etching by sputtering
20429808, 20429823, C23C 1400
Patent
active
06074538&
ABSTRACT:
A gate valve for a thin film forming apparatus. The gate valve includes two adjoining low-pressure chambers and a wall separating the two chambers. The wall includes an aperture and a thin plate for covering the aperture. The thin plate is movable in a direction substantially parallel to the plate surface. The gate valve further includes a voltage supply for applying a direct current between the thin plate and the wall.
REFERENCES:
patent: 4313815 (1982-02-01), Graves
patent: 4384918 (1983-05-01), Abe
patent: 4547247 (1985-10-01), Warrenbach
patent: 4715921 (1987-12-01), Maher
patent: 4747577 (1988-05-01), Dimock
patent: 4756810 (1988-07-01), Lamont, Jr.
patent: 4812712 (1989-03-01), Ohnishi
patent: 4818326 (1989-04-01), Lui
patent: 4824546 (1989-04-01), Ohmi
patent: 4851101 (1989-07-01), Hutchinson
patent: 4897171 (1990-01-01), Ohmi
patent: 4944860 (1990-07-01), Branhall
patent: 5082242 (1992-01-01), Bonne
patent: 5161774 (1992-11-01), Engelsdorf
Ohmi Tadahiro
Shibata Tadashi
Umeda Masaru
Nuzzolillo Maria
Ohmi Tadahiro
Weiner Laura
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