Apparatus and process for rapid sewage sludge separation

Liquid purification or separation – Processes – Chemical treatment

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

210806, 210808, 210130, 210201, 210207, 2102212, 210533, 210540, C02F 178

Patent

active

046953884

ABSTRACT:
The present invention relates to an apparatus for use in a sewage sludge treatment system comprising a hyperbaric vessel including sludge inlet means for conveying sludge to the vessel to be accumulated in a lower portion of the vessel, a sludge delivery means having a discharge end for delivering sludge particles from the lower portion to an upper portion of the vessel, oxygen inlet means for delivering oxygen to the upper portion of the vessel to oxygenate the sludge particles at a hyperatmospheric pressure therein, the oxygenated particles falling to and being collected in the lower portion of the vessel, gas outlet means for removing gas from the upper portion of the vessel, a sludge outlet means for rapidly removing the oxygenated sludge from the lower portion of the vessel using the pressurized oxygen as a propellant, the sludge outlet means comprising a discharge pipe connected to the lower portion of the vessel for conducting sludge to a separation apparatus, and a rapidly opening valve means controlling flow of the oxygenated sludge through the discharge pipe.

REFERENCES:
patent: 3444076 (1969-05-01), Sekikawa et al.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Apparatus and process for rapid sewage sludge separation does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Apparatus and process for rapid sewage sludge separation, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Apparatus and process for rapid sewage sludge separation will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-2057153

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.