Charged beam lithography apparatus and method thereof

Details Charged beam lithography apparatus and method thereof Charged beam lithography apparatus and method thereof

1999-06-07

2000-10-31

Anderson, Bruce C.

Radiant energy

Means to align or position an object relative to a source or...

250397, 25049222, H01J 3730, H01J 37244

Patent

active

061406546

ABSTRACT:
A charged beam lithography method simultaneously uses multiple charged beams to irradiate a workpiece. In specific embodiments, collimators are employed to assist in aligning the multiple charged beams by eliminating "noise" from reflections of other beams. Each collimator is positioned to correspond with respective of the charged beams and detectors for detecting reflected particles from the charged beams. The particles are reflected from particular marks used in the alignment process. Each collimator helps to prevent particles from adjacent charged beams from entering a detector that corresponds with a specific charged beam

REFERENCES:
patent: 4636968 (1987-01-01), Gotou et al.
patent: 4673918 (1987-06-01), Adler et al.
patent: 4812662 (1989-03-01), Gato et al.
patent: 4974736 (1990-12-01), Okunuki et al.
patent: 5047647 (1991-09-01), Itoh et al.
patent: 5122663 (1992-06-01), Chang et al.
patent: 5134298 (1992-07-01), Inagaki et al.
patent: 5155355 (1992-10-01), Kabaya
patent: 5256881 (1993-10-01), Yamazaki et al.
patent: 5270771 (1993-12-01), Sato
patent: 5334846 (1994-08-01), Nakano et al.
patent: 5369282 (1994-11-01), Arai et al.
patent: 5373163 (1994-12-01), Sigg
patent: 5430292 (1995-07-01), Honjo et al.
patent: 5523576 (1996-06-01), Koide et al.
patent: 5557110 (1996-09-01), Itoh
patent: 5608226 (1997-03-01), Yamada et al.
T.H.P. Chang, et al., "Arrayed Miniature Electron Beam Columns for High Throughput Sub-100nm Lithography", J. Vac. Sci. Technol. B., vol. 10, No. 6, Nov./Dec. 1992 pp. 2743-2748.
N. Shimazu, et al., "An Approach to a High-Throughput E-Beam Writer with a Single-Gun Multiple-Path System", Jpn. J. Appl. Phys., vol. 34, No. 12B, Dec. 1995, pp. 6689-6695.

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