Electron beam type exposure apparatus

Details Electron beam type exposure apparatus Electron beam type exposure apparatus

1979-11-30

1981-05-12

Anderson, Bruce C.

Radiant energy

Irradiation of objects or material

Irradiation of semiconductor devices

250398, H01J 3700

Patent

active

042674565

ABSTRACT:
An electron beam type exposure apparatus includes an electron generator for emitting electron beams modulated in accordance with dot data read out of a memory, a drive unit for vertically moving a table carrying a workpiece on which a pattern is to be drawn, and a scanning unit for scanning the surface of the workpiece by electron beams. The exposure apparatus further includes an image selection circuit for judging from dot pattern data read out of the memory whether a pattern to be drawn on the workpiece represents a regular or mirror image, and the dot data are read out of the memory in the order defined by the direction in which the workpiece-carrying table is moved and also by an output logic signal from the image selection circuit.

REFERENCES:
patent: 3900737 (1975-08-01), Collier et al.
patent: 4051381 (1977-09-01), Trotel
patent: 4119857 (1978-10-01), Desperques-Volmier
patent: 4151421 (1979-04-01), Sumi
patent: 4181860 (1980-01-01), Sumi

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