Method for thermal chemical vapor deposition

Coating processes – Coating by vapor – gas – or smoke

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427255, 4272551, 4272552, 427250, 427314, C23C 1600

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active

058515895

ABSTRACT:
A method and an apparatus for a CVD comprising feeding a first gas flow, including a reactive gas, in a laminar flowing state and in a sheet state parallel to the surface of a substrate and feeding a second gas flow, including a non-reactive gas, in a direction perpendicular to that of said first gas flow, externally controlling the flow rates of the first and second gases so as to retain the laminar flowing state of said first gas flow and concentrate said first gas flow in the vicinity of said substrate and externally controlling the flow rate of said second gas flow to provide control and uniformity in the thickness of the layer to be formed.

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Zorpette, "True Blue, on the verge of realizing the quest for a blue laser", Scientific American, Sep. 1997, p. 36.

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