Metal working – Method of mechanical manufacture – Electrical device making
Patent
1981-11-23
1983-12-06
Hall, Carl E.
Metal working
Method of mechanical manufacture
Electrical device making
360121, 360122, G11B 542
Patent
active
044184727
ABSTRACT:
A method for delineating vertically configured thin film magnetic heads formed upon silicon wafer substrates. A plurality of thin film magnetic head arrays are formed on a (110) oriented surface of a single crystal silicon substrate so that the edges of the arrays are aligned parallel to the {111} planes of the substrate. Following photolithographic formation of a mask, ion beam milling perpendicular to the (110) oriented surface of the silicon substrate delineates the thin film magnetic head array structures. Thereafter, the remainder of the silicon substrate is anisotropically etched to completely delineate the individual array structures.
REFERENCES:
patent: 3344237 (1967-09-01), Gregg
patent: 3787964 (1974-01-01), Simon et al.
patent: 4049944 (1977-09-01), Garvin et al.
patent: 4085022 (1978-04-01), Wechsung et al.
patent: 4147564 (1979-04-01), Magee et al.
Stoller, "The Etching of Deep Vertical-Walled Patterns in Silicon," RCA Review, 31,271 (Jun. 1970).
Lazzari, "Integrated Magnetic Recording Heads: Review and Outlook," Am. Institute of Physics Conf. Proceedings 18,990 (1973).
Chynoweth, "Pedro-A Transducer-Per-Track Recording System with Batch-Fabricated Mag. Film Read/Write Transducers," Honeywell Computer Journal 7,103 (1973).
Bollinger, "Ion Milling for Semiconductor Production Processes," Solid State Technology, 66 (Nov. 1977).
Lee, "Microfabrication by Ion-Beam Etching," J. Vac. Sci. Technol., 16 (2), 164 (Mar./Apr. 1979).
Petersen, "Thin Film Magnetic Heads," IBM Tech. Disclosure Bulletin, 21, No. 12,5002 (May, 1979).
Bean et al, "Appln. of Silicon Crystal Orientation & Anisotropic Effects to the Control of Charge Spreading in Devices," IEEE J. Sol. Stat. Circ. SC-9 , No. 3,111 (Jun. 1974).
Romankiw et al, "Batch Fabrication of Thin Film Mag. Recording Heads: A Lit. Review & Process Description for Vertical Single Turn Heads," IEEE Trans. Mag. MAG-11,50 (1975).
Kendall, "On Etching Very Narrow Grooves in Silicon," Appl. Phys. Lett., 26, No. 4, 195 (Feb. 15, 1975).
Hall Carl E.
Xerox Corporation
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