Reflection type mask and manufacture of microdevices using the s

Details Reflection type mask and manufacture of microdevices using the s Reflection type mask and manufacture of microdevices using the s

1993-12-01

1996-04-02

Rosasco, S.

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

430311, 430322, 378 34, 378 35, G03F 900

Patent

active

055039502

ABSTRACT:
A reflection type mask for X-ray lithography based on a phase shift method. A multilayered film of the mask is locally irradiated with an energy beam to provide a phase shifter, on the basis of a change in film thickness period resulting from a temperature rise. By heating the multilayered film to 100 deg. (.degree.C.) or a few hundred deg. (.degree.C.), a film thickness period change of a few percentages occurs without substantially changing the reflectivity. Thus, by selecting the heating condition suitably, a desired phase shifter for changing the phase of reflected light by .pi. can be provided.

REFERENCES:
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patent: 5190836 (1993-03-01), Nakagawa et al.
patent: 5328784 (1994-07-01), Fukuda
Kola, et al., "Stress Relaxation in Mo/Si Multilayer Structures," Appl. Phys. Lett., vol. 60, No. 25, Jun. 1992, pp. 3120 through 3122.
Ishii, et al., "Multilayer Mirror for Soft X-ray Synchrotron Radiation," NTT Review, vol. 2, No. 4, Jul. 1990, pp. 77 through 85.
Patent Abstracts of Japan, Kokai No. 02-177532, vol. 14, No. 448, Sep. 1990.
Sakaue, et al., "Mo-Si Multilayered Films for Soft X-Ray Mirrors," Thin Solid Films, vol. 201, No. 1, Jun. 1991, pp. 155 through 165.
Kinoshita, et al., "Soft X-Ray Reduction Lithography Using Multilayer Mirrors," J. Vac. Sci. Technol., vol. B7, No. 6, Nov./Dec. 1989, pp. 1648 through 1651.
Hsieh, et al., "All-Reflective Phase-Shifting Masks for Markle-Dyson Optics," J. Vac. Sci. Technol., vol. B10, No. 6, Nov./Dec. 1992, pp. 3042 through 3046.
Tennant, et al., "Defect Repair for Soft X-Ray Projection Lithography Masks," J. Vac. Sci. Technol., vol. B10, No. 6, Nov./Dec. 1992, pp. 3134 through 3140.

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