Projection exposure apparatus and device manufacturing method

Details Projection exposure apparatus and device manufacturing method Projection exposure apparatus and device manufacturing method

1997-12-29

2000-08-15

Metjahic, Safet

Photocopying

Projection printing and copying cameras

Step and repeat

355 67, G03B 2742, G03B 2754

Patent

active

061044725

ABSTRACT:
A projection exposure apparatus includes a projection optical system for projecting a pattern of a mask onto a substrate. The projection optical system includes a pair of aspherical members, at least one of which is displaceable in a direction orthogonal to an optical axis of the projection optical system. The aspherical members have aspherical surface shapes which are determined so that an optical characteristic of the aspherical members as a unit changes with a change in positional relationship between the aspherical surfaces of the aspherical members with respect to the orthogonal direction. Also, an optical characteristic of the projection optical system is adjustable in response to displacement of the at least one of the aspherical members in the direction orthogonal to the optical axis.

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