Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...
Patent
1997-01-31
1997-12-30
Chu, John S.
Radiation imagery chemistry: process, composition, or product th
Diazo reproduction, process, composition, or product
Composition or product which contains radiation sensitive...
430192, 430193, G03F 7023
Patent
active
057028621
ABSTRACT:
A positive photoresist coating solution comprising (a) an alkali-soluble resin, (b) a quinone diazide group-containing compound, and (c) an organic solvent in an amount sufficient for dissolving said (a) and (b) components, wherein said organic solvent contains (i) propylene glycol monopropyl ether and (ii) 2-heptanone. The solution of the present invention exhibits excellent coating ability, sensitivity, thermostability, focal depth range, shape-profiling ability, and the like.
REFERENCES:
patent: 5279922 (1994-01-01), Adachi et al.
patent: 5336583 (1994-08-01), Uetani et al.
patent: 5437952 (1995-08-01), Hirai et al.
patent: 5514515 (1996-05-01), Zampini et al.
patent: 5604077 (1997-02-01), Kono et al.
patent: 5612164 (1997-03-01), Canize et al.
Harada Hisanobu
Hidesaka Shinichi
Kohara Hidekatsu
Nakao Taku
Nakayama Toshimasa
Chu John S.
Tokyo Ohka Kogyo Co. Ltd.
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