Meterology using interferometric measurement technology for meas

Details Meterology using interferometric measurement technology for meas Meterology using interferometric measurement technology for meas

1989-08-07

1992-03-24

Turner, Samuel

Optics: measuring and testing

By dispersed light spectroscopy

Utilizing a spectrometer

25023116, 250237G, G01B 902

Patent

active

050981900

ABSTRACT:
A metrology system includes means for generating an interference fringe pattern as a function of a parameter to be measured, transducer apparatus for simultaneously generating three intensity-modulated optical signals, I.sub.R, I.sub.S and I.sub.T, that are related to the interference fringe pattern; signal processing apparatus for accurately determining an aspect of the interference fringe pattern from the three signals; means for accumulating phase information proportional to the aspect of the interference fringe pattern; and means for converting the accumulated phase and aspect information to desired outputs indicative of the parameter to be measured.

REFERENCES:
patent: 3523735 (1970-08-01), Taylor
patent: 4631416 (1986-12-01), Trutna, Jr.
patent: 4676645 (1987-06-01), Taniguchi
patent: 4710026 (1987-12-01), Magome
patent: 4728193 (1988-03-01), Bartelt
patent: 4764014 (1988-08-01), Makosch
patent: 4776698 (1988-10-01), Crosdale
patent: 4776701 (1988-10-01), Pettigrew
patent: 4815850 (1989-03-01), Kanayama
patent: 4815854 (1989-03-01), Tanaka
patent: 4828392 (1989-05-01), Nomura
Mertz, "Complex Interferometry", Applied Optics, vol. 22, No. 10, May 15, 1983.
Hercher, et al., "Design of Optical Systems", Proceedings of SPIE--The International Society for Optical Engineering, vol. 741, pp. 174-185 (1987).

Affiliated with

Also associated with

Rating

Meterology using interferometric measurement technology for meas does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Meterology using interferometric measurement technology for meas, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Meterology using interferometric measurement technology for meas will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-2005002