Method of manufacturing thin film and thin film device

Details Method of manufacturing thin film and thin film device Method of manufacturing thin film and thin film device

1992-03-30

1994-11-22

Beck, Shrive

Coating processes

Coating by vapor, gas, or smoke

Base supplied constituent

4272556, 427261, C23C 1604

Patent

active

053667662

ABSTRACT:
Introducing a raw material organic substance onto a substrate surface, causing polymerization of the raw material organic substance on the substrate surface and causing deposition of the resultant polymer on the substrate surface, previously forming a pattern on the substrate surface with at least two kinds of substances and/or through surface modification, and selectively forming an organic thin film only on this pattern or only on a portion other than the pattern. By this procedure, it is possible to directly deposit and form a thin pattern of an organic thin film, such as a film having a thickness up to 10 .mu.m.

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Applied Physics Letters, vol. 59, 4 Nov. 1991, No. 19, pp. 2466-2468, A. Sekiguchi et al., "Micrometer patterning of phthalocyanines by selective chemical vapor deposition".
Journal of Vacuum Science & Technology A, Second Series, vol. 10, No. 4, Part II, Jul./Aug. 1992, pp. 1508-1510, A. Sekiguchi et al., "Micrometer Pattering of phthalocyanine derivatives by selective chemical vapor deposition method".

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