Plasma processing apparatus including an electromagnet with a bi

Details Plasma processing apparatus including an electromagnet with a bi Plasma processing apparatus including an electromagnet with a bi

1990-08-03

1991-08-06

Paschall, Mark H.

Electric heating

Metal heating

By arc

2191214, 156646, 20429817, 20429837, B23K 900, C23C 1434

Patent

active

050380133

ABSTRACT:
A plasma etching apparatus comprises a chamber, a holding table for holding samples, such as a semiconductor substrate to be etched, in the chamber, a plasma-generating device for generating a plasma within the chamber, and a magnetic-field-forming device which forms a magnetic field perpendicular to the surface of the sample placed on the holding table and parallel the inner wall of the chamber.

REFERENCES:
patent: 4761219 (1988-08-01), Sasaki et al.
patent: 4826585 (1989-05-01), Davis
patent: 4911814 (1990-03-01), Matsuoka et al.
Deposition of Co-Cr Films by Perpendicular Magnetic Recording Kadokura et al., vol. MAG-17, No. 6, pp. 3175-3177.

Affiliated with

Also associated with

Rating

Plasma processing apparatus including an electromagnet with a bi does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Plasma processing apparatus including an electromagnet with a bi, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Plasma processing apparatus including an electromagnet with a bi will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1988830