Leak detection in a reduced pressure processing apparatus

Details Leak detection in a reduced pressure processing apparatus Leak detection in a reduced pressure processing apparatus

1993-07-09

1994-11-22

Breneman, R. Bruce

Measuring and testing

With fluid pressure

Leakage

118715, 118720, 118725, 20429803, 20429807, 117 86, G01M 304

Patent

active

053657721

ABSTRACT:
A reduced pressure processing apparatus includes a processing vessel for performing predetermined processing to an object to be processed in a reduced pressure atmosphere, an exhaust mechanism, including a main exhaust system having a relatively high exhaust pressure and a sub-exhaust system having a relatively low exhaust pressure, for evacuating the processing vessel, and an oxygen gas concentration sensor for detecting an oxygen gas concentration in the processing vessel during exhaust performed by the sub-exhaust system. The oxygen gas concentration in the processing vessel is detected while the processing vessel is evacuated with a relatively low exhaust pressure. It is determined whether leakage is present or absent by confirming a detection value is a predetermined value or less within a predetermined period of time. When leakage is absent, the processing vessel is evacuated with the relatively high exhaust pressure. When leakage is present, the exhaust is interrupted, and necessary processing is performed. When the processing vessel is set in a desired reduced pressure state, predetermined processing is performed to the substrate.

REFERENCES:
patent: 4492110 (1985-01-01), Bergquist
patent: 4773276 (1988-09-01), Saulgeot
patent: 4776207 (1988-10-01), Holme
patent: 4779449 (1988-10-01), Bley et al.
patent: 4793283 (1988-12-01), Sarkozy
patent: 5199994 (1993-04-01), Aoki
J. W. Coburn "Plasma etching and reactive ion etching" AVS monograph series, American vacuum society 1982, pp. 13-17.

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