Exposing apparatus and exposing method of works

Details Exposing apparatus and exposing method of works Exposing apparatus and exposing method of works

1995-01-27

1997-02-25

Berman, Jack I.

Radiant energy

Irradiation of objects or material

Irradiation of semiconductor devices

2504921, 25045311, 355 85, 355 89, G03F 720, G03F 900

Patent

active

056061722

ABSTRACT:
An exposing apparatus provided with a first alignment stage B, a first exposing stage C, a reverse stage D, a second alignmen stage E and a second exposing stage F in which the first alignment stage B, the reverse stage D and the second alignment stage E being provided in a straight line and each of the first alignment stage B and the second alignment stage E being provided in perpendicular dirction to the straight line the first exposing stage C and the second exposing stage F, respectively, and the ultraviolet rays irradiation stage H being located between the first exposing stage C and the second exposing stage F, offers an improved exposing apparatus of smaller installation space, the upper printing frame being replaced very easily when deteriorated after long time use, the lower printing frame properly absorb and displace the work from the lower printing frame, smaller consumption of the electricity, and forming of the vacuum frame and locating of the work are performed efficiently and accurately.

REFERENCES:
patent: 4555630 (1985-11-01), Sheets et al.
patent: 4571073 (1986-02-01), Diedrich et al.
IBM Technical Disclosure Bulletin, vol. 30, No. 12, May 1988, pp. 209-210 "Remote Location Optical Registration System", anonymous.

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