Vacuum processing apparatus, vacuum processing method, and metho

Details Vacuum processing apparatus, vacuum processing method, and metho Vacuum processing apparatus, vacuum processing method, and metho

1996-12-24

1998-07-28

Breneman, R. Bruce

Adhesive bonding and miscellaneous chemical manufacture

Differential fluid etching apparatus

With microwave gas energizing means

118715, 118719, 20429825, 20429832, 20429833, 20429835, 134 11, 134 12, 134 13, 216 59, 216 63, 216 67, 438905, C23F 102, C23C 1600, C23C 1456, B08B 700

Patent

active

057857962

ABSTRACT:
A vacuum processing apparatus includes a plurality of vacuum processing chambers for processing a target object using a process gas, a vacuum convey chamber, connected to the plurality of vacuum processing chambers, for loading/unloading the target object into/from the processing chambers, an opening/closing means opened/closed to cause the plurality of vacuum processing chambers to communicate with the vacuum convey chamber, and a cleaning gas supply means for supplying a cleaning gas containing ClF.sub.3 into at least one of the vacuum convey chamber and the plurality of vacuum processing chambers. The cleaning gas is supplied into the plurality of vacuum processing chambers and the vacuum convey chamber communicating with each other by opening the opening/closing means to clean the plurality of vacuum processing chambers and the vacuum convey chamber.

REFERENCES:
patent: 5186718 (1993-02-01), Tepman et al.
patent: 5254176 (1993-10-01), Ibuka et al.
patent: 5286296 (1994-02-01), Sato et al.
patent: 5308431 (1994-05-01), Maher et al.
patent: 5380370 (1995-01-01), Niino et al.

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