Photomask used by photolithography and a process of producing sa

Details Photomask used by photolithography and a process of producing sa Photomask used by photolithography and a process of producing sa

1993-06-24

1997-02-25

Rosasco, S.

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

430318, 430323, 4302721, G03F 900

Patent

active

056057750

ABSTRACT:
A photomask used by photolithography and a process for producing same which allows a single exposure to make a photomask, thereby simplifying the photomask making process, and facilitating the inspection and correction of photomasks. In addition, the phase shifter using a slanting pattern prevents a pattern from being formed outside a predetermined area. The use of a phase shifter which does not resolve under an optical projection system shields a large size area against an irradiated light, thereby allowing the formation of fine, intricate patterns suitable for use in LSIs.

REFERENCES:
patent: 3771872 (1973-11-01), Nightingdale et al.
patent: 4686162 (1987-08-01), Stangl et al.
patent: 4762396 (1988-08-01), Dumant et al.
patent: 5045417 (1991-09-01), Kamoto
patent: 5100503 (1992-03-01), Allman et al.
Communication dated Sep. 6, 1994.
EPO Search Report 91110169.3.

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