Photomask for the measurement of resolution of exposure equipmen

Details Photomask for the measurement of resolution of exposure equipmen Photomask for the measurement of resolution of exposure equipmen

1995-04-03

1996-11-26

Rosasco, S.

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

430 22, 430 30, 356400, 356401, G03F 900

Patent

active

055784011

ABSTRACT:
There are disclosed photomasks for the measurement of resolution of exposure equipment, comprising two superimposed patterns, each of which has a plurality of identical sub-patterns and is symmetric on its central axis, the two being aligned in such a way that the spaces between their opposite, corresponding sub-patterns become wider or narrower, in sequence, or comprising a plurality of concentric patterns which are interconnected by connecting films, the connecting films being formed in the space between the concentric patterns.

REFERENCES:
patent: 4881257 (1989-11-01), Nakagawa

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