Phase shift mask and method for repairing a defect of a phase sh

Details Phase shift mask and method for repairing a defect of a phase sh Phase shift mask and method for repairing a defect of a phase sh

1994-09-21

1995-11-07

Rosasco, S.

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

430321, 430323, 216 48, 03F 900, G03F 900

Patent

active

054647134

ABSTRACT:
In a phase shift mask and a method for repairing a defect of a phase shift mask according to the present invention, a phase shifter defective portion in which a portion of a phase shifter portion is missing is formed in a region including a boundary between a light transmitting portion and a phase shifter portion, and phase shifter defective portion is supplemented with a repairing member having substantially the same transmittance as that of phase shifter portion and capable of converting a phase of exposure light by 180.degree.. Thus, a defect of the phase shifter portion generated on or in the vicinity of the boundary between the light transmitting portion and the phase shifter portion can be repaired without impairing a function as a phase shift mask.

REFERENCES:
patent: 4890309 (1989-12-01), Smith et al.
patent: 5382484 (1995-01-01), Hosono

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