Synthetic resins or natural rubbers -- part of the class 520 ser – Synthetic resins – From carboxylic acid or derivative thereof
Patent
1997-03-13
1998-05-26
Cooney, Jr., John M.
Synthetic resins or natural rubbers -- part of the class 520 ser
Synthetic resins
From carboxylic acid or derivative thereof
428395, 4284111, 4284735, 430170, 430191, 430192, 4302701, 528170, 528172, 528173, 528176, 528183, 528185, 528188, 528220, 528229, 528310, 528322, 528342, C08G 7310
Patent
active
057566500
ABSTRACT:
A polyimide precursor composition, which comprises, a polyamic acid having a repeating unit represented by the following general formula (PA), and at least one kinds of cure accelerator selected from the group consisting of a substituted or unsubstituted nitrogen-containing heterocyclic compound exhibiting an acid dissociation index "pKa" of a proton complex ranging from 0 to 8 in an aqueous solution thereof, or an N-oxide compound of said nitrogen-containing heterocyclic compound (AC1), a substituted or unsubstituted amino acid compound (AC2), and an aromatic hydrocarbon compound or an aromatic heterocyclic compound having a molecular weight of 1,000 or less and two or more hydroxyl groups (AC3): ##STR1## wherein .phi. is a quadrivalent organic group, .phi. is a bivalent organic group, R is a substituted or unsubstituted hydrocarbon group, organosilicic group or hydrogen atom.
REFERENCES:
patent: 5578697 (1996-11-01), Kawamonzen et al.
patent: 5585217 (1996-12-01), Oba
Masayuki Oba, "Effect of Curing Accelerators on Thermal Imidization of Polyamic Acids at Low Temperature", Journal of Polymer Science: Part A: Polymer Chemistry, vol. 34, 1996, pp. 651-658.
M. Oba, "Effect of Cure Accelerator on Imidization of Polyamic Acid at Low Temperature", Polymer Preprints, Japan, vol. 43, No. 7, 1994, pp. 2087-2088.
Masayuki Oba, et al., "Synthesis and Evaluation of Positive-Acting Photosensitive Polyimides with Phenol Moiety", Journal of Applied Polymer Science, vol. 58, 1995, pp. 1535-1542.
M. Oba, "Synthesis and Characterization of Positive Working Photosensitive Polyimide", Polymer Preprints, Japan, vol. 42, No. 7, 1993, pp. 2691-2693.
Kawamonzen Yoshiaki
Matake Shigeru
Mikoshiba Satoshi
Oba Masayuki
Cooney Jr. John M.
Kabushiki Kaisha Toshiba
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