Method for forming a dielectric thin film or its pattern of high

Details Method for forming a dielectric thin film or its pattern of high Method for forming a dielectric thin film or its pattern of high

1992-08-07

1994-04-19

Hearn, Brian E.

Fishing, trapping, and vermin destroying

437235, 437238, H01L 21469

Patent

active

053045157

ABSTRACT:
A method and apparatus for forming a dielectric thin film or pattern thereof is provided in which a positive or negative resist of a desired pattern is formed on various substrates including a semiconductor substrate by contact of the resist with a liquefied gas or super critical fluid of CO.sub.2, NH.sub.3 or the like. Alternatively, a thin film of an organic or inorganic compound dissolved or dispersed in an organic solvent which has been formed on substrate becomes substantially free of any organic matter or functional groups by contact with the liquefied gas or super critical fluid. Semiconductor devices of high performance and high reliability are ensured.

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