Method of making integrated circuits

Coating processes – Electrical product produced – Integrated circuit – printed circuit – or circuit board

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Details

156603, 156613, 156649, 156643, 1566591, 204192E, 204192EC, 427 94, 427 96, H01L 21316, H01L 2176

Patent

active

043616003

ABSTRACT:
A method of forming in a substrate of monocrystalline silicon semiconductor material having a major surface, a plurality of islands of silicon each including an active region of the substrate adjacent the major surface and surrounded by a body of silicon dioxide separating the islands from the substrate is described.

REFERENCES:
patent: 4292156 (1981-09-01), Matsumoto et al.
patent: 4333964 (1982-06-01), Ghezzo
patent: 4333965 (1982-06-01), Chow
Tango et al., "SOS LSI Technology", Toshiba Review, No. 113, pp. 34-37, Jan.-Feb. 1978.

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