Optical: systems and elements – Deflection using a moving element – By moving a reflective element
Patent
1994-11-14
1996-09-03
Dzierzynski, Paul M.
Optical: systems and elements
Deflection using a moving element
By moving a reflective element
359223, 359318, G02B 2608
Patent
active
055529240
ABSTRACT:
An electrically addressable, integrated, monolithic, micromirror device (10) is formed by the utilization of sputtering techniques, including various metal and oxide layers, photoresists, liquid and plasma etching, plasma stripping and related techniques and materials. The device (10) includes a selectively electrostatically deflectable mass or mirror (12) of supported by one or more beams (18) formed by sputtering and selective etching. The beams (18) are improved by being constituted of an electrically conductive, intermetallic aluminum compound, or a mixture of two or more such compounds. The materials constituting the improved beams (18) have relatively high melting points, exhibit fewer primary slip systems than FCC crystalline structures, are etchable by the same or similar etchants and procedures used to etch aluminum and aluminum alloy, and are stronger and experience less relaxation than aluminum or aluminum alloys. Accordingly, the improved beams (18) exhibit increased strength, and decreased relaxation without requiring significant or radical deviations from the typical processing steps employed to produce the otherwise unaltered device.
REFERENCES:
patent: 4728185 (1988-03-01), Thomas
patent: 5041851 (1991-08-01), Nelson
patent: 5061049 (1991-10-01), Hornbeck
patent: 5079544 (1992-01-01), DeMond et al.
patent: 5096279 (1992-03-01), Hornbeck et al.
patent: 5101236 (1992-03-01), Nelson et al.
Donaldson Richard L.
Dzierzynski Paul M.
Kesterson James C.
Klinger Robert C.
Schuberg Darren E.
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