Reverse osmosis membrane

Liquid purification or separation – Filter – Supported – shaped or superimposed formed mediums

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

21050035, 21050042, B01D 6912

Patent

active

054645387

ABSTRACT:
Novel reverse osmosis membranes and a method for preparing such membranes are described. A substrate can be coated with a first compound bearing a plurality of onium groups and a second compound bearing a plurality of nucleophilic groups. The resulting coating cures readily upon exposure to actinic radiation.

REFERENCES:
patent: 3189457 (1965-06-01), Burness
patent: 3320141 (1967-05-01), Cisney et al.
patent: 3335100 (1967-08-01), Geyer
patent: 3462274 (1969-08-01), Maeder et al.
patent: 4058401 (1977-11-01), Crivello
patent: 4069054 (1978-01-01), Smith
patent: 4069055 (1978-01-01), Crivello
patent: 4069056 (1978-01-01), Crivello
patent: 4081276 (1978-03-01), Crivello
patent: 4102687 (1978-07-01), Crivello
patent: 4108747 (1978-08-01), Crivello
patent: 4109068 (1978-08-01), Graham
patent: 4118297 (1978-10-01), Broxterman et al.
patent: 4133684 (1979-01-01), Tarumi
patent: 4175963 (1979-11-01), Crivello
patent: 4229519 (1980-10-01), Sharp et al.
patent: 4250203 (1981-02-01), Schlesinger et al.
patent: 4338232 (1982-07-01), Harris et al.
patent: 4405426 (1983-09-01), Hosoi et al.
patent: 4423136 (1983-12-01), Crivello et al.
patent: 4431782 (1984-02-01), Harris et al.
patent: 4466931 (1984-08-01), Tamsy
patent: 4544466 (1985-10-01), Lindstrom et al.
patent: 4544621 (1985-10-01), Roth
patent: 4551418 (1985-11-01), Hult et al.
patent: 4564580 (1986-01-01), Ichimura et al.
patent: 4610952 (1986-09-01), Crivello
patent: 4632891 (1986-12-01), Banks et al.
patent: 4668601 (1987-05-01), Kistner
patent: 4704324 (1987-11-01), Davis et al.
patent: 4749639 (1988-06-01), Frommeld
patent: 4765905 (1988-08-01), Kitamura et al.
patent: 4797187 (1989-01-01), Davis et al.
patent: 4798877 (1989-01-01), Hoffman et al.
patent: 4839203 (1989-06-01), Davis et al.
patent: 4921654 (1990-05-01), Hou et al.
patent: 4941972 (1990-07-01), Kau et al.
Farrington and Daniels, Physical chemistry, 1979, Ch. 11, p. 343.
Maycock and Berchtold, Photochemical Reactions of Phenacyl- and Benzylsulfonium Salts, J. Org. Chem., vol. 35, No. 8, 1970, pp. 2532-2538.
B. Arnold et al., Homolytic versus heterolytic cleavage for the photochemistry of 1-naphthylmethyl derivatives. Feb. 28, 1985, pp. 3140-3146.
B. Foster et al, Substituent effects on homolytic versus heterolytic cleavage of (1-naphthylmethyl) trimethylammonium chlorides. Oct. 10, 1986. pp. 1599-1607.
K. Inomata et al, "Synthesis of Multifunctional Polymeric Photosensitizers Containing Pendant Benzopehnone Radical and Various Quaternary Salt Structure and the Photchemical Reaction Using These Polymers", J. Chem. Soc., Japan, 1989 (7) pp. 1129-1134.
M. Ko et al, "Photopolymerization of Vinyl Monomers with Quaternary Ammonium Salts", J. Poly. Sci: Polymer Chemistry Edition, vol. 12, pp. 2943-2951 (1974).
Lloyd D. Taylor et al, "The Phtochemical Rearrangement of Polymeric N-(1-Pyridinio) Amidates. A Novel, Aqueous Photresist System", J. Poly. Sci: Part Polymer Letters, vol. 26, pp. 177-180 (1988).
G. D. Jones et al., "Water-Soluble Photocurable Elastomer", Journal of Applied Polymer Science, vol. 23, pp. 115-122 (1979).
M. A. Ratcliff, Jr. et al., "Solvolytic and Radical Processes in the Photolysis of Benzylammonium Salts", Journal of Organic Chemisty, vol. 36, No. 21, pp. 3112-3120 (1971).
A. Kunieda et al., "Free-Radical Polymerizaton by Sulfonium Salt", Polymer Letters Edition, vol. 12, pp. 395-397 (1974).
Abstract, J1-C3 Semi-permeable sepn, 1274F, 46029, Japanese Kokai J6 1249-502A, Publication No. JP 090661 (Jun. 11, 1986).
Minoru Kumakura et al., "Properties of Membranes Obtained by Radiation Cast Polymerizaton of Hydroxyalkyl Methacrylate Monomers", J. Membrane Sci., 17 (1984) pp. 71-77.
D. L. Schmidt, "Polymerization of Aryl Cyclic Sulfonium Switterions", reprint from ACS Symposium Series, No. 59, Ring-Opening Polymerization (1977).
D. L. Schmidt et al., "Water-Based Coatings From Aryl Cyclic Sulfonium Zwitterion (ACSZ) Monomers", reprint from Jan. 1974 issue of the Journal of Paint Technology, vol. 46; No. 588, pp. 41-46.
J. F. King et al., "Nucleophilic Substitution Factors. 1. Coplanar vs. Orthogonal Bimolecular Substitution at a Benzylic Carbon. X-ray Structure of 2-Isobutyl-1,3-dihydrobenso[c]thiophenium Perchlorate", J. Am. Chem. Soc. 1985, 107, pp. 3224-3232.
Melvin J. Hatch et al., "Sulfonium Polymers Derived from Ar-Vinylbenzyl Chloride. I. Exploratory Study of the Preparation and Properties of the Monomers and Polymers", J. Applied Polymer Science, vol. 13, pp. 721-744 (1969).
Franklin D. Saeva et al., "Mechanism of One-Electron Electrochemical Reductive Cleavage Reactions of Sulfonium Salts", J. Am. Chem. Soc., (1984), 106, pp. 4121-4125.
J. V. Crivello, "Cationic Polymerization--Iodonium and Sulfonium Salt Photoinitiators", Advances in Polymer Science 62, (1984) pp. 1-48.
S. Peter Pappas et al., "Photoinitiated Cationic Polymerization by Photosensitization of Onium Salts", (1979) Soc. of Photographic Scientists and Engineers pp. 140-143.
James V. Crivello et al., "Rencent Advances in Thermally and Photochemically Initiated Cationic Polymerization", Polymer Journal, vol. 17, No. 1, (1985) pp. 73-78.
J. V. Crivello, "Recent Progress in the Design of New Photoinitiators for Cationic Polymerization", Cationic Polymerization and Related Processes ISBN 0.12.287470.6 (1984) pp. 289-305.
F. Volatron et al., "Theoretical Study of the Reactivity of Phosphonium and Sulfonium Ylides with Carbonyl Groups", J. Am. Chem. Soc., (1984) 106, pp. 6117-6119.
J. D. Coyle, "Photochemistry of Sulphonium Compounds", The Chemistry of the Sulfonium Group Edited by C. J. M. Stirling and S. Patai (1981) Chapter 5, pp. 107-122.
Takayuki Otsu et al., "Polymerization of Methyl Methacrylate with Dimethylbenzylanilinium Chloride", J. Polymer Sci., Part A-1, vol. 7 (1969) pp. 3329-3336.
S. Peter Pappas, "UV Curing by Radical, Cationic and Concurrent Radical-Cationic Polymerization", Radiat. Phys. Chem., vol. 25, Nos. 4-6, (1985) pp. 633-641.
E. Reichmanis et al., "Polymer Materials for Microlithography", Ann. Rev. Mater. Sci. (1987), 17, pp. 235-271.
S. K. Chadda et al., "Novel Thin-Film Composite Membranes Containing Photoreactive Groups Part I: Choosing the Photoreactive Group", Synopsis, Dept. of Chemistry, Dept. of Chemical Engineering, McMaster Univ., Hamilton, Ontario, Canada, pp. 1-23, Table 1-7, two pages of figures.
Howard E. Zimmerman et al., "Mechanistic Organic Photochemistry. II. Solvolytic Photochemical Reactions", Organic and Biological Chemistry, vol. 85, Apr. 5, 1963, pp. 915-922.
Cheng-I Lin et al., "Charge-Transfer-Induced Photosolvolysis of Benzyl Alcohols" Communications to the Editor, J. Am. Chem. Soc., 98:21, Oct. 13, 1976 pp. 6711-6713.
Cheng-I Lin et al., "Wavelength Dependent Carbonium Ion Fromation by Photosolvolysis of Benzoates", Communications to the Editor, J. Am. Chem. Soc., 98:24, Nov. 24, 1976, pp. 7848-7850.
C. G. Roffey, "Photopolymerization of Surface Coatings", a Wiley-Interscience Publication, pp. 287-296 and 301-304 (1982).

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Reverse osmosis membrane does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Reverse osmosis membrane, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Reverse osmosis membrane will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-195164

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.