Coating apparatus – Immersion or work-confined pool type – Work-confined pool
Patent
1975-12-11
1977-03-22
Stein, Mervin
Coating apparatus
Immersion or work-confined pool type
Work-confined pool
118412, 148172, 156622, B05C 309
Patent
active
040130401
ABSTRACT:
Apparatus for epitaxially growing a laminate semiconductor layer in liquid phase on the crystalline surface of a substrate by successively bringing different kinds of liquid phase epitaxial growth solution into contact with the surface of a substrate, which is characterized in that different kinds of liquid phase epitaxial growth solutions are injected one after another into solution receptacle, the bottom of which is open to the substrate surface, and each of the preceding one of the epitaxial growth solutions is expelled from the solution receptacle by each succeeding one of the epitaxial growth solutions for interchange between both solutions and thereafter each succeeding solution is epitaxially grown on the preceding one.
REFERENCES:
patent: 3665888 (1972-05-01), Bergh et al.
patent: 3755011 (1973-08-01), Kleinknecht et al.
patent: 3767481 (1973-10-01), Ettenberg et al.
patent: 3821039 (1974-06-01), Ettenberg et al.
patent: 3940296 (1976-02-01), Van Oirschot et al.
IBM Technical Disclosure Bulletin, vol. 15, No. 8, Jan. 1973; p. 2368; Apparatus for Continuous Liquid Phase Epitaxy Growth, J. M. Blum et al.
Nippon Telegraph and Telephone Public Corporation
Stein Mervin
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