Method of manufacturing reticle

Details Method of manufacturing reticle Method of manufacturing reticle

1994-11-04

1996-09-03

Rosasco, S.

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

430296, G03F 900

Patent

active

055522505

ABSTRACT:
A method of manufacturing a reticle having a desired pattern, includes the step of projecting electron beams to a mask blank including a glass substrate on which an electron beam sensitive layer is applied. The mask blank is held in place in the same situation as a situation in which the reticle is held when a stepper exposes a semiconductor wafer to light through said reticle. For instance, the mask blank being in place so that the electron beam sensitive layer faces downwardly and the electron beams is projected from a bottom of the layer. The method can eliminate dimensional errors of a pattern and a dislocation of a pattern on a semiconductor wafer which might occur due to a curvature of a reticle.

REFERENCES:
patent: 5202204 (1993-04-01), Kawahira et al.

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