Organic magnetic film and method of manufacturing the same

Details Organic magnetic film and method of manufacturing the same Organic magnetic film and method of manufacturing the same

1993-03-03

1996-09-03

Kiliman, Leszek

Stock material or miscellaneous articles

Composite

Of inorganic material

428694T, 428694TS, 428900, 156326, 156329, 1563309, 427127, 427128, 427129, 427130, G11B 566, C09J 502, B05D 512

Patent

active

055522360

ABSTRACT:
According to the invention, the surface of a substrate possessing an active hydrogen group is contacted with a chemical adsorbent containing a radical generation precursor group or metal ion capturing group within a molecule--also possessing a reactive functional group such as halosilyl or alkoxy silyl at its end--to form a chemical adsorption film by removing the unreacted chemical adsorbent, radicals are then generated and magnetism is expressed on the chemical adsorption film.

REFERENCES:
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patent: 5158833 (1992-10-01), Matsuoka et al.
K. Ogawa, et al "Reactions of Chemically Adsorbed Monolayers Induced by Electron Beam Irradiation in Active Gas Atmosphere and Applications for the Preparation of Multilayers", Langmuir, vol. 6, No. 4, 1990.
K. Ikegami et al. Thin Solid films 160 (1988) 139-143.
Patent Abstracts of Japan, unexamined applications, E field, vol. 15, No. 397, Oct. 8, 1991, The Patent Office Japanese Government, p. 37 E 1120 No. 03-160 708 (Sumitomo).
Patent Abstracts of Japan, unexamined applications, C field, vol. 12, No. 482, Dec. 15, 1988, The Patent Office Japanese Government, p. 109 C 553 No. 63-199 741 (Mitsui).
P. A. Chollet, J. Phys., C: Solid State Phys., 7, 4127 (1974).
K. Ikegami, et al., Thin Solid Films, 179, 139 (1989).
I. Hamachi, et al., J. Am. Chem. Soc., 112, 6744 (1990).
S. Kuroda, et al., Thin Solid Films, 159, 285 (1988).

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