Method of determining position offset of a pattern

Details Method of determining position offset of a pattern Method of determining position offset of a pattern

1996-03-14

1997-09-23

Trammell, James P.

Boots, shoes, and leggings

356375, 382145, 382151, G01B 1103, G03F 900

Patent

active

056711654

ABSTRACT:
A method of determining position offset is obtained which allows accurate determination of the magnitude of position offset even though the magnitudes of position offset of the outermost shots are not actually measured. According to the method of determining position offset, magnitudes of offset of the designated shots on the surface of a wafer other than the outermost shots are actually measured, and based on the measured magnitudes of offset, the magnitudes of position offset of the outermost shots are calculated and magnitudes of offset are calculated finally taking into consideration the magnitudes of position offset of the outermost shots. As a result, accurate error data can be derived even without actually measuring the magnitudes of offset of the outermost shots.

REFERENCES:
patent: 4342090 (1982-07-01), Caccoma et al.
patent: 5493402 (1996-02-01), Hirukawa
Asakura Shoten, SQC Riron Jissai, Sep. 20, 1992, pp. 26-31.
Ian Fink et al, Overlay Sample Plan Optimization for the Detection of Higher Order Contributions to Misalignment, Digital Equipment Corporation, SPIE vol. 2196, 1994.

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