Apparatus and method for cleaning semiconductor wafers

Details Apparatus and method for cleaning semiconductor wafers Apparatus and method for cleaning semiconductor wafers

1991-11-27

1993-06-08

Chaudhuri, Olik

Fishing, trapping, and vermin destroying

29 2501, 134 7, 51413, 51424, 51436, H01L 21304, H01L 21306, B24C 332

Patent

active

052179257

ABSTRACT:
In an apparatus and a method for cleaning semiconductor wafers, an exhaust chamber having a sub-outlet slows down the flow of frozen micro-particles and thus prevents rebounding of the particles toward the wafer. Therefore, dust or the like is kept away from a cleaned semiconductor wafer so that the semiconductor wafers are cleaned more thoroughly.

REFERENCES:
patent: 4820650 (1989-04-01), Nagae et al.
patent: 4974375 (1990-12-01), Tada et al.
patent: 5025597 (1991-06-01), Tada et al.
patent: 5035750 (1991-07-01), Tada et al.
patent: 5081068 (1992-01-01), Endo et al.
patent: 5129198 (1992-07-01), Kanno et al.

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