Chemistry: electrical and wave energy – Processes and products – Vacuum arc discharge coating
Patent
1991-10-03
1993-06-08
Weisstuch, Aaron
Chemistry: electrical and wave energy
Processes and products
Vacuum arc discharge coating
20419217, 4272557, 4273833, 427404, 4274192, C23C 1434, C23C 1418
Patent
active
052175898
ABSTRACT:
A method of metallizing a substrate by vacuum depositing a thin layer of chromium. The substrate is first cleaned (16) by exposing it to a plasma gas discharge. A thin layer of chromium metal is then sputtered under vacuum (17) onto the substrate. The substrate is then heated in an oxygen containing atmosphere (18) for a period of time and at a temperature sufficient to convert the chromium metal to chromium oxide. A second layer of chromium metal is then sputtered (20) onto the chromium oxide layer in order to form an adherent metal system to the substrate.
REFERENCES:
patent: 4604168 (1986-08-01), Liu et al.
patent: 4695517 (1987-09-01), Okuno et al.
patent: 4761345 (1988-08-01), Sato et al.
patent: 4840853 (1989-06-01), Iio et al.
patent: 5096749 (1992-03-01), Harada et al.
Arledge John K.
Davis James L.
Swirbel Thomas J.
Dorinski Dale W.
Motorola Inc.
Weisstuch Aaron
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