Slow vent valve

Valves and valve actuation – Fluid actuated or retarded – With adjustable limit stop for actuator

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Details

251 634, 251285, 251331, F16K 31122

Patent

active

053908953

ABSTRACT:
A slow vent valve for semiconductor wafer manufacturing equipment is disclosed, which generates a gentle flow of nitrogen gas to the vacuum chamber enough to maintain an undisturbed ambient environment for the wafer being processed in the chamber, protecting the product from disturbed by particulate raised or objectionable ambient stirring caused by the entering gas. The valve includes an adjustable cam mechanism including a valve open timing adjuster and a slow-venting adjuster. The valve open timing adjuster changes the initial diaphragm pressing force on the valve seat, to thereby determine the open speed and the open timing of the valve to take a lift off the valve seat. The slow venting adjuster is provided to adjust the resistance of a spring that exerts downward pressure on a second piston integrated with the valve rod, to thereby slow the slightly upward movement of the rod to operate the diaphragm to permit a slowed flow of nitrogen gas to the vacuum chamber.

REFERENCES:
patent: 4169405 (1979-10-01), Tsunemoto et al.
patent: 4801051 (1989-01-01), Lewis et al.
patent: 4903939 (1990-02-01), Ariizumi et al.

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