Multi-electron-beam pattern drawing apparatus

Details Multi-electron-beam pattern drawing apparatus Multi-electron-beam pattern drawing apparatus

1988-04-27

1990-01-30

Fields, Carolyn E.

Radiant energy

Irradiation of objects or material

Irradiation of semiconductor devices

250396R, 250398, 250397, 2504923, G21K 510

Patent

active

048975524

ABSTRACT:
A charged-particle beam pattern drawing apparatus for drawing, by use of a charged-particle beam, a desired circuit pattern on a workpiece having a surface coated with a sensitive material, is disclosed. The apparatus includes a data source having data stored therein related to the circuit pattern, a plurality of charged-particle beam producing sources for emitting charged-particle beams toward the workpiece, in accordance with the data supplied thereto from the data source, and a plurality of deflecting electrodes each being provided for a corresponding one of the charged-particle beam producing source, for deflecting the charged-particle beams from the charged-particle beam producing sources independently of each other and in accordance with the data supplied from the data source.

REFERENCES:
patent: 4259678 (1981-03-01), Van Gorkom et al.
patent: 4418283 (1983-11-01), Trotel
patent: 4810889 (1989-03-01), Yokomatsu et al.

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