Method of chamber cleaning in MOCVD applications

Details Method of chamber cleaning in MOCVD applications Method of chamber cleaning in MOCVD applications

1993-06-22

1995-11-07

Kastler, Scott

Cleaning and liquid contact with solids

Processes

Including application of electrical radiant or wave energy...

134 30, 134 31, B08B 300

Patent

active

054640318

ABSTRACT:
The invention is a process for cleaning a chamber after a chemical vapor deposition has been performed therein. A residue formed during the deposition is combined with a reactive species to form a gas containing an organic substance once found in the residue and to form a film on the chamber walls and internal parts. The gas and the film are removed from the chamber. The formation of a polymer byproduct on the chamber walls and other internal parts of the chamber is minimized by the method of the invention.

REFERENCES:
patent: 5204314 (1993-04-01), Kirlin et al.
patent: 5207836 (1993-05-01), Chang
patent: 5252518 (1993-10-01), Sandhu et al.
patent: 5281302 (1994-01-01), Gabric et al.
patent: 5286301 (1994-02-01), Albrecht
patent: 5362328 (1994-11-01), Gardiner et al.

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