Method of partially eliminating the bird's beak effect without a

Details Method of partially eliminating the bird's beak effect without a Method of partially eliminating the bird's beak effect without a

1990-06-06

1991-09-17

Hearn, Brian E.

Fishing, trapping, and vermin destroying

437 52, 437 69, 437228, 148DIG117, 148DIG106, H01L 2170

Patent

active

050495208

ABSTRACT:
A method of partially eliminating the field oxide bird's beak over a storage cell and slightly enlarging the storage cell active area without adding any process steps is described. A photomask is used during a buried contact etch to reduce the field oxide bird's beak both vertically and horizonally. The storage cell active area is further enlarged during a first polysilicon etch step without adding process steps. At that point, the wafer is completed by existing techniques.

REFERENCES:
patent: 4044454 (1977-08-01), Magdo
patent: 4458406 (1984-07-01), De La Moneda et al.
patent: 4466177 (1984-08-01), Chao
patent: 4743566 (1986-05-01), Bastiaens et al.

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