Observation system for a projection exposure apparatus

Details Observation system for a projection exposure apparatus Observation system for a projection exposure apparatus

1989-04-03

1989-12-19

Wintercorn, Richard A.

Photocopying

Projection printing and copying cameras

Identifying, composing, or selecting

355 45, 355 53, G03B 2752, G03B 2770, G03B 2728, G03B 2742

Patent

active

048886149

ABSTRACT:
An observation system, usable with a projection optical system for optically projecting a first object upon a second object by use of a light of a first wavelength, for observing the second object by way of the projection optical system and by use of a light of a second wavelength different from the first wavelength. The observation system includes an observation optical system having a lens element and a parallel-surface plate which is inclined with respect to an optical axis of the observation optical system, wherein the observation optical system is arranged to form an image of the second object on a predetermined image surface and wherein the parallel-surface plate is arranged to substantially correct coma caused by the projection optical system.

REFERENCES:
patent: 3963353 (1976-06-01), Hemstreet
patent: 4215934 (1980-08-01), Karasawa et al.
patent: 4422755 (1983-12-01), Phillips
patent: 4437758 (1984-03-01), Suzuki
patent: 4441250 (1984-04-01), Imahashi
patent: 4473293 (1984-09-01), Phillips
patent: 4530082 (1985-07-01), Howe et al.
patent: 4573791 (1986-03-01), Phillips
patent: 4592650 (1986-06-01), Tabarelli et al.
patent: 4595289 (1986-06-01), Feldman et al.
patent: 4601577 (1986-07-01), Gotou et al.
patent: 4619524 (1986-10-01), Tabarelli et al.
patent: 4657379 (1987-04-01), Suwa
patent: 4660966 (1987-04-01), Kato et al.
patent: 4668077 (1987-05-01), Tanaka
patent: 4681430 (1987-07-01), Goel et al.
patent: 4687322 (1987-08-01), Tanimoto et al.
patent: 4690529 (1987-09-01), Sugiyama et al.
patent: 4704020 (1987-11-01), Murakami et al.

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