Vapor phase epitaxy-hydride technique with a constant alloy sour

Fishing – trapping – and vermin destroying

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427253, 156614, 437110, 437949, H01L 2120

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048883034

ABSTRACT:
A continouous process of forming an epitaxial layer of InGaAs using a vapor phase epitaxial-hydride technique having a pressure controlled source of hydrogen chloride gas to maintain a partial pressure of the gas as a function of time as the amount of gallium is depleted from the alloy source melt of Ga/In during the growth of the epitaxial layer.

REFERENCES:
patent: 4147571 (1979-04-01), Stringfellow et al.
patent: 4407694 (1983-10-01), Eu et al.
patent: 4689094 (1987-08-01), Van Rees et al.
patent: 4729968 (1988-03-01), Karlicek, Jr.
patent: 4801557 (1989-01-01), Wessels et al.
patent: 4808551 (1989-02-01), Mori et al.
Tu et al., "Effects of Varying The Input and Downstream HCl . . . Hydride Growth of Int.," J. Crys. Growth, 70 (1984), pp. 117-122.
Quinlan et al., "Formation . . . of Ga.sub.x In.sub.l-x As In the VPE-Hydride . . . Hydrogen Chloride Etc.", J. Crys. Growth, 71 (1985), pp. 246-248.
Jones et al., ". . . Lattice Matching of InGaAs to InP," J. Crys. Growth, 70 (1984), pp. 127-132.
Pogge et al. "Doping Behavior of Silicon in Vapor-Growth III-V Epitaxial Film," J. Crys. Growth, 31 (1975), pp. 183-189.

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