Metal treatment – Compositions – Heat treating
Patent
1980-08-11
1981-12-15
Massie, Jerome W.
Metal treatment
Compositions
Heat treating
29571, 29576B, 29580, 148187, 156626, 156657, 156662, 427 95, 427399, H01L 2122, H01L 2126, H01L 21308, H01L 21316
Patent
active
043057608
ABSTRACT:
A process for forming polysilicon-to-substrate contacts. The process permits the use of a polysilicon-to-substrate contact mask and eliminates the exposure of the substrate in the contact regions to the polysilicon etch. The polysilicon contact-forming conductors are formed from a layer of polysilicon by etching partially through the layer to leave a residual layer surrounding and defining the conductors; converting the residual polysilicon to oxide; and selectively etching the oxide. The result is a damage-free substrate contact region exhibiting reduced junction leakage current.
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Cavender J. T.
Dalton Philip A.
Massie Jerome W.
NCR Corporation
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