Coating apparatus – Gas or vapor deposition – Multizone chamber
Patent
1998-01-26
2000-02-15
Dang, Thi
Coating apparatus
Gas or vapor deposition
Multizone chamber
156345, 414217, 414222, 4147446, 414739, B25J 2100, H01L 2100
Patent
active
060248009
ABSTRACT:
According to the present invention, a plasma processing apparatus for performing surface processing of a substrate by means of plasma discharge is provided comprising: a processing chambers 10R and 10L for performing surface processing of a substrate W; a load-lock chamber 11 which is arranged in between these processing chambers 10R and 10L; and transporting mechanisms which are capable of performing substrate transport between load-lock chamber 11 and processing chamber 10R, and between load-lock chamber 11 and processing chamber 10L; these transporting mechanisms are freely movable in a reciprocating manner in the direction in which processing chamber 10R, load-lock chamber 11, and processing chamber 10L are contiguously arranged; wherein, upper wing 20U and lower wing 20L, which are spaced apart in a vertical manner with respect to each other, are provided as the aforementioned transporting mechanisms.
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Katsura Toshimi
Miyazawa Hideaki
Soejima Yukio
Dang Thi
Plasma System Corp.
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