Apparatus and method for drying substrates

Details Apparatus and method for drying substrates Apparatus and method for drying substrates

1997-11-06

2000-05-30

Bennett, Henry

Drying and gas or vapor contact with solids

Process

By centrifugal force

34325, 34470, 34 58, 34 76, F26B 508

Patent

active

060677279

ABSTRACT:
A cover is provided to an opening of a chamber in such a manner to open and close the opening and when the cover closes the opening, the chamber and the cover form a sealed drying process space. In this drying process space, nitrogen gas is supplied to purge the gas in the drying process space to turn into an inert gas filled space. Thereafter, substrates to be treated are brought into the drying process space. nitrogen gas is further supplied to the drying process space and then the substrates are being rotated to dry the same.

REFERENCES:
patent: 5351415 (1994-10-01), Brooks et al.
patent: 5369891 (1994-12-01), Kamikawa
patent: 5591264 (1997-01-01), Sugimoto et al.
patent: 5678116 (1997-10-01), Sugimoto et al.
patent: 5715612 (1998-02-01), Schwenkler

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