Single wafer megasonic semiconductor wafer processing system

Details Single wafer megasonic semiconductor wafer processing system Single wafer megasonic semiconductor wafer processing system

1990-10-16

1992-02-25

Coe, Philip R.

Cleaning and liquid contact with solids

Apparatus

With means to movably mount or movably support the work or...

134 1, 134184, 134902, B08B 312

Patent

active

050904329

ABSTRACT:
A semiconductor wafer processing system utilizing a specially constructed wet processing chamber for a single wafer and a megasonic, or high frequency, energy dispensing system. The construction of the container causes megasonic energy to become intensified near the surface of the wafer, thereby providing more cleaning power, and resulting cleaning. The megasonic device may be mounted on a bottom wall dump valve. Also, the energy output may be used to rotate a wafer.

REFERENCES:
patent: 2760501 (1956-08-01), Gander
patent: 3077155 (1963-02-01), Maddock et al.
patent: 3401708 (1968-09-01), Henes
patent: 4902350 (1990-02-01), Steck

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