Apparatus for the galvanic deposition of aluminum

Chemistry: electrical and wave energy – Processes and products

Patent

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Details

204213, 204275, 204277, C25D 500, C25D 1718

Patent

active

043604099

ABSTRACT:
A system for the galvanic deposition of aluminum from aprotic organo-aluminum electrolytes free from oxygen and water wherein it is not necessary to remove a galvanizing drum from its associated galvanizing tank in order to load and unload work pieces being galvanized from the drum.

REFERENCES:
patent: 3425926 (1969-02-01), Hojyo
patent: 4066515 (1978-01-01), Stoger

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