Low-hygroscopic sulfur-containing urethane resin, coating materi

Synthetic resins or natural rubbers -- part of the class 520 ser – Synthetic resins – From reactant having at least one -n=c=x group as well as...

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

528 67, 528 85, 528374, C08G 1838, C08G 1852, C08G 1887

Patent

active

051264250

ABSTRACT:
There are here provided a low-hygroscopic sulfur-containing and crosslinked structure-having urethane resin, urethane resin plate and shape-recoverable molding article which is prepared by first selecting a polyisocyanate compound having m (which is an integer of 2 or more) isocyanate groups in one molecule and a polythiol compound having n (which is an integer of 2 or more) thiol groups in one molecule so that the total number of m+n may be 5 or more, and then polymerizing the composition of the polyisocyanate compound and the polythiol compound; a low-hygroscopic sulfur-containing urethane coating material which comprises the above composition; and a low-hygroscopic sulfur-containing urethane adhesive which comprises the composition. In the resin of the present invention, its water absorption is as low as a level of 0.02 to 0.20% by weight, and its adhesion to a hard coating film is also good. The coating material and the adhesive of the present invention have a long pot life, a low water absorption and a high adhesive force even after dipping in warm water.

REFERENCES:
patent: 3114734 (1963-12-01), Gobran et al.
patent: 3124544 (1964-03-01), Proops
patent: 3591560 (1971-07-01), Wagner et al.
patent: 3640965 (1972-02-01), Brode et al.
patent: 3681272 (1972-08-01), Gloskey
patent: 4525570 (1985-06-01), Blum et al.
patent: 4680369 (1987-07-01), Kajimoto et al.
patent: 4689387 (1987-08-01), Kajimoto et al.
patent: 4775733 (1988-10-01), Kanemura et al.
patent: 4945127 (1990-07-01), Kagawa et al.
patent: 4950258 (1990-08-01), Kawai et al.
patent: 5049591 (1991-09-01), Hayashi et al.
patent: 5057252 (1991-10-01), Kagawa et al.
Saunders et al, "Polyurethane", p. 617.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Low-hygroscopic sulfur-containing urethane resin, coating materi does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Low-hygroscopic sulfur-containing urethane resin, coating materi, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Low-hygroscopic sulfur-containing urethane resin, coating materi will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-1864564

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.