Method of forming a thin polymeric film by plasma reaction under

Details Method of forming a thin polymeric film by plasma reaction under Method of forming a thin polymeric film by plasma reaction under

1990-05-14

1992-06-30

Lusignan, Michael

Coating processes

Electrical product produced

Integrated circuit, printed circuit, or circuit board

427 38, 4272556, 4272551, B05D 306, C23C 1600

Patent

active

051261642

ABSTRACT:
A process for forming a thin polymeric film is disclosed, which comprises introducing a mixture of an organic monomer gas and helium into a reaction vessel, producing a glow discharge plasma at atmospheric pressure and depositing the plasma on a substrate wherein the helium in the gas mixture is present in an amount higher than 90% by volume.

REFERENCES:
patent: 4223048 (1980-09-01), Engle
patent: 4292384 (1981-09-01), Straughan et al.
patent: 4532022 (1985-07-01), Takasaki et al.
patent: 4616597 (1986-10-01), Kaganowicz
patent: 4834020 (1989-05-01), Bartholomew et al.

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